|RiOs-DI® Water Purification Systems|
|UV Oxidation in Water Purification|
|Reference overview||Pub Med ID|
|Water Purification Technologies and Silica Breakthrough |
American Laboratory News April 2002
The presence of silica in ultrapure water has long been recognized as an issue in several areas of research and routine testing. In particular, applications in the microelectronics industry are particularly known for their sensitivity to silica, but instruments such as weatherometers, autoclaves, and clinical analyzers also require silica-free water to avoid instrument defection and erroneous results. Hence, the avoidance of silica in the final purification system should be a basic and primary concern. It is therefore extremely important to have a well-designed pretreatment system to remove the bulk of silica and to avoid silica release. While some pretreatment methods and systems are very efficient in removing silica, others have a low efficacy due to the materials used or to system misuse. The most widely used water purification technologies are deionization (DI), reverse osmosis (RO), and electrodeionization (EDI). Their effect on and pertinence for silica removal are discussed in terms of silica chemistry and behaviour under different conditions in this paper and comparative data is presented for these three purification technologies.Full Text Article
Superior quality pure water and easy maintenance
RiOs-DI systems provide users with a compact solution that efficiently combines reverse osmosis technology with deionization resins to produce high quality pure water with high resistivity and low TOC (> 10 MΩ•cm and < 30 ppb). Water produced by the systems is superior to that of service DI or stills, and users have none of the maintenance, storage and cleaning issues associated with these other purification methods. The system’s product water is stored in an internal reservoir, and is ideal for low volume laboratory applications.
The unique, simple “plug-and-use” purification pack enables the production of high quality (Type 2) water from tap water. To ensure reliable contaminant removal, the system’s pump will continue to send a steady flow of tap water to the cartridge, in spite of low pressure on the supply side or a drop in water temperature.
- Buffer and reagent preparation
- Microbiological culture media preparation
- General washing
- Combining several purification technologies including Reverse Osmosis and Deionization, RiOs-DI systems remove all types of water contaminants (typically > 99 %).
- The built-in 254 nm UV lamp* is ideal for applications that require low bacteria levels.
- The consumable is a unique “all-in-one” pack that includes the pretreatment, reverse osmosis membrane and ion-exchange resin.
- Maintenance is reduced to the quick change of a single cartridge.
- Backlit color display shows resistivity and temperature values, water level in reservoir, and alarms if necessary.
- Integrated, compact 6-liter reservoir.
* This system is also available without a UV lamp.
|Pure (Type 2) Product Water Quality||RiOs-DI Systems|
|Resistivity||> 10 MΩ•cm @ 25 °C|
|Production flow rate||3 L/h @ 15 °C +/-15 %|
|Organics, particulates||> 99 % rejected typically|
|Dimensions (H x W x D)||50 x 29 x 33 cm (19.7 x 11.4 x 13 in)|
|Net weight (RiOs-DI system w/o 254 nm UV lamp)||7.3 kg (16.1 lb)|
|Net weight (RiOs-DI system with 254 nm UV lamp)||7.8 kg (17.2 lb)|
|Operating weight (RiOs-DI system w/o 254 nm UV lamp)||16.7 kg (36.7 lb)|
|Operating weight (RiOs-DI system with 254 nm UV lamp)||17.3 kg (38 lb)|
|Built-in reservoir volume||6 L|
|Electrical feed voltage||100-250 V +/- 10 %|
|Electrical feed frequency||50-60 Hz +/- 10 %|
|Tap (feed) water connection||½” Gaz M|
|Tap (feed) water pressure||0.5 to 6 bar|